Low-Cost Aacvd As The Proven Method to Fabricate Carbon Solar Cell

Abstract

To deposit amorphous carbon (a-C) thin films for carbon-based solar cell applications, a novel self-prepared Aerosol-Assisted Chemical Vapour Deposition (AACVD) system was created. At deposition temperatures of 600°C and 650°C, nitrogen doping was applied to a-C thin films. Using the solar simulator system in low-light conditions, the samples demonstrated the photoresponse characteristic for electrical measurements.The nanostructured sized a-C:N (100nm) is represented by FESEM pictures, and the EDX spectrum confirms the presence of N content in the N doped a-C. When the a-C:N was coated on a p-Si substrate, the solar cell efficiency was 0.001648% at 650°C and 0.000124% at 600°C. The presence of rectifying curves at the a-C:N/p-Si junction implies hetero-junction behaviour between the p-n structure and hence demonstrates successful N doping of a-C utilising the AACVD process.